Sains Malaysiana 45(8)(2016): 1207–1211

Fabrication of Flourine Doped Tin Oxide with Different Volume of Solvents on FTO Seed Layer by Hydrothermal Method

(Fabrikasi Flourin Terdop Timah Oksida dengan Jumlah Pelarut Berbeza ke atas Lapisan Benih FTO melalui Kaedah Hidroterma)

 

M.L. MOHD NAPI*, N. NAYAN, M.K. AHMAD, F.I.M. FAZLEE, N.K.A. HAMED

& N.S. KHALID

 

Microelectronics and Nanotechnology, Shamsuddin Research Centre (MiNT- SRC), Universiti Tun Hussein Onn Malaysia, 86400 Batu Pahat, Johor Darul Takzim, Malaysia

 

Diserahkan: 20 April 2015/Diterima: 18 November 2015

 

ABSTRACT

Flourine doped tin oxide films were synthesized by using hydrothermal method with different volume of solvents. The thin film growth was carried out by fixing the concentration of tin and fluorine element precursors by only varying their solvents which were 2-propanol and DI water. The fabrication of FTO thin film by using mineral salt group as tin precursor with hydrothermal method on soda lime glass showed that the nanostructured growth did not distribute largely and took longer time. The seed layer of FTO has been used to overcome these problems thus the thin film growth distributed largely in short time. These experiments were conducted at a constant of hydrothermal temperature and reaction time which were 150°C and 5 h respectively. The result showed that, there was a change on the surface morphology in the formation of FTO films. The minimum value of sheet resistance was 0.1475 Ω/sq which was obtained using 65 mL of 2-propanol and 20 mL of DI water was lower than sheet resistance of commercial FTO films of 01693 Ω/sq. This fabricated FTO films showed a good transparency with higher of transmittance than 80%. The experimental findings suggested that 65 mL amount of 2-propanol and 20 mL of DI water in precursor solutions could produce the better of FTO performance than commercial FTO.

 

Keywords: Electrical properties; hydrothermal method; nanoparticle; thin film; water

 

ABSTRAK

Flourin terdop timah oksida telah disintesis menggunakan kaedah hidroterma dengan pelbagai jumlah isi padu pelarut. Pertumbuhan filem nipis dijalankan dengan mengekalkan kepekatan unsur timah dan flourin dengan hanya mengubah isi padu pelarut iaitu 2-propanol dan air suling. Fabrikasi filem nipis FTO dengan menggunakan kaedah hidroterma di atas sampel kaca kosong telah menunjukkan bahawa pertumbuhan struktur nano tidak menyeluruh dan mengambil masa yang lama. Lapisan benih FTO telah digunakan untuk mengatasi masalah ini seterusnya menghasilkan pertumbuhan filem nipis yang menyeluruh dalam masa yang singkat. Penyelidikan ini dijalankan dengan mengekalkan suhu hidroterma iaitu 150°C selama 5 jam bagi tempoh reaksi. Hasil kajian menunjukkan terdapat perubahan pada sifat permukaan bagi pembentukan filem nipis FTO. Nilai rintangan minimum helaian ialah 0.1475 Ω/sq yang diperoleh dengan menggunakan isi padu pelarut sebanyak 65 mL 2-propanol dan 20 mL air ternyahion yang lebih rendah nilainya jika dibandingkan dengan nilai rintangan helaian bagi FTO komersial iaitu sebanyak 0.1693 Ω/sq. Filem nipis FTO yang difabrikasi ini menunjukkan sifat kelutsinaran yang baik iaitu nilai kepancaran yang lebih tinggi daripada 80%. Hasil kajian mencadangkan bahawa dengan menggunakan 65 mL 2-propanol dan 20 mL air ternyahion dalam larutan pelopor boleh menghasilkan perilaku FTO yang lebih baik berbanding FTO komersial.

 

Kata kunci: Air; filem nipis; kaedah hidroterma; sifat elektrik; zarah nano

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*Pengarang untuk surat menyurat; email: mluqmannapi@gmail.com